Role of vapor pressure of 1,4-bis(trimethylsilyl)benzene in developing silicon carbide thin film using a plasma-assisted liquid injection chemical vapor deposition process

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Date

2011

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Volume Title

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Abstract

Description

Keywords

Organosilane compound, Transpiration technique, Vapor pressure, Plasma-assisted CVD, Silicon carbide

Source

Surface & Coatings Technology, 2011. Vol. 205 (11): pp. 3493-3498

URI

http://hdl.handle.net/123456789/5503

Collections

2011