Relevance of Thermodynamic and Kinetic Parameters of Chemical Vapor Deposition Precursors

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dc.contributor.authorSelvakumar, J.
dc.contributor.authorNagaraja, K. S.
dc.contributor.authorSathiyamoorthy, D.
dc.date.accessioned2012-03-12T06:19:20Z
dc.date.available2012-03-12T06:19:20Z
dc.date.issued2011
dc.format.extent4685 bytes
dc.format.mimetypetext/html
dc.identifier.sourceJournal of Nanoscience & Nanotechnology, 2011. Vol. 11 (9): pp. 8190-8197en
dc.identifier.urihttp://hdl.handle.net/123456789/5846
dc.language.isoenen
dc.subjectMetallorganic and Organometallic Precursorsen
dc.subjectThermogravimetryen
dc.subjectAntoine Coefficientsen
dc.subjectSolid-State Kineticsen
dc.subjectActivation Energyen
dc.subjectThin Filmsen
dc.titleRelevance of Thermodynamic and Kinetic Parameters of Chemical Vapor Deposition Precursorsen
dc.typeArticleen

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