Relevance of Thermodynamic and Kinetic Parameters of Chemical Vapor Deposition Precursors

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Date

2011

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Keywords

Metallorganic and Organometallic Precursors, Thermogravimetry, Antoine Coefficients, Solid-State Kinetics, Activation Energy, Thin Films

Source

Journal of Nanoscience & Nanotechnology, 2011. Vol. 11 (9): pp. 8190-8197

URI

http://hdl.handle.net/123456789/5846

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2011