In-depth analysis of impurities in HFCVD diamond thin films grown from acetone/hydrogen mixtures

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dc.contributor.authorRoy, M.
dc.contributor.authorGeorge, V. C.
dc.contributor.authorDua, A. K.
dc.date.accessioned2021-08-20T10:27:53Z
dc.date.available2021-08-20T10:27:53Z
dc.date.issued2003
dc.description.divisionNM&SCDen
dc.format.extent4121 bytes
dc.format.mimetypetext/html
dc.identifier.sourceDiamond and Related Materials, 2003. Vol. 12 (9): pp. 1569-1575en
dc.identifier.urihttp://hdl.handle.net/123456789/23312
dc.language.isoenen
dc.subjectDiamond filmsen
dc.subjectHot filament chemical vapor deposition (HFCVD)en
dc.subjectAcetone–Hydrogen mixturesen
dc.subjectImpuritiesen
dc.subjectSecondary ion mass spectrometry (SIMS)en
dc.subjectNuclear resonant reaction analysis (NRRA)en
dc.titleIn-depth analysis of impurities in HFCVD diamond thin films grown from acetone/hydrogen mixturesen
dc.typeArticleen

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