Study of reactive electron beam deposited tantalum penta oxide thin films with spectroscopic ellipsometry and atomic force microscopy

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dc.contributor.authorTokas, R. B.
dc.contributor.authorJena, S.
dc.contributor.authorPrathap, C.
dc.contributor.authorThakur, S.
dc.contributor.authorDivakar Rao, K.
dc.contributor.authorUdupa, D. V.
dc.date.accessioned2024-09-18T06:09:02Z
dc.date.available2024-09-18T06:09:02Z
dc.date.issued2023
dc.description.divisionA&MPDen
dc.format.extent4943 bytes
dc.format.mimetypetext/html
dc.identifier.sourceApplied Surface Science Advances, 2023. Vol. 18: Article no. 100480en
dc.identifier.urihttp://hdl.handle.net/123456789/27442
dc.language.isoenen
dc.subjectTantalum penta oxide thin filmsen
dc.subjectElectron beam depositionen
dc.subjectSpectroscopic ellipsometryen
dc.subjectAtomic force microscopyen
dc.subjectGrazing incidence X-ray reflectivityen
dc.titleStudy of reactive electron beam deposited tantalum penta oxide thin films with spectroscopic ellipsometry and atomic force microscopyen
dc.typeArticleen

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