A Comparison of Electron, Proton and Gamma Irradiation Effects on the I-V Characteristics of 200 GHz SiGe HBTs
dc.contributor.author | Hegde, V. N. | |
dc.contributor.author | Pradeep, T. M. | |
dc.contributor.author | Pushpa, N. | |
dc.contributor.author | Bhushan, K. G. | |
dc.date.accessioned | 2019-06-03T06:16:25Z | |
dc.date.available | 2019-06-03T06:16:25Z | |
dc.date.issued | 2018 | |
dc.description.division | TPD | en |
dc.format.extent | 4312 bytes | |
dc.format.mimetype | text/html | |
dc.identifier.source | IEEE Transactions on Device and Materials Reliability, 2018. Vol. 18 (4): Article no. 8486666 | en |
dc.identifier.uri | http://hdl.handle.net/123456789/18624 | |
dc.language.iso | en | en |
dc.subject | SiGe HBTs | en |
dc.subject | Irradiation | en |
dc.subject | EB spacer oxide | en |
dc.subject | STI oxide | en |
dc.subject | Current gain degradation | en |
dc.subject | Isochronal annealing | en |
dc.title | A Comparison of Electron, Proton and Gamma Irradiation Effects on the I-V Characteristics of 200 GHz SiGe HBTs | en |
dc.type | Article | en |