Local crystal structure and mechanical properties of sputtered Ti-doped AlN thin films
dc.contributor.author | Panda, P. | |
dc.contributor.author | Krishna, N. G. | |
dc.contributor.author | Rajput, P. | |
dc.date.accessioned | 2019-09-06T08:50:24Z | |
dc.date.available | 2019-09-06T08:50:24Z | |
dc.date.issued | 2018 | |
dc.description.division | A&MPD | en |
dc.format.extent | 4701 bytes | |
dc.format.mimetype | text/html | |
dc.identifier.source | Physical Chemistry Chemical Physics, 2018. Vol. 20: pp. 29817-29825 | en |
dc.identifier.uri | http://hdl.handle.net/123456789/19268 | |
dc.language.iso | en | en |
dc.subject | Local crystal structure | en |
dc.subject | nano-mechanical property | en |
dc.subject | sputtered Ti-doped AlN thin films | en |
dc.subject | X-ray absorption spectroscopy (XAS) | en |
dc.title | Local crystal structure and mechanical properties of sputtered Ti-doped AlN thin films | en |
dc.type | Article | en |