Role of substrate temperature in the pulsed laser deposition of zirconium oxide thin film

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dc.contributor.authorMittra, J.
dc.contributor.authorAbraham, G. J.
dc.contributor.authorKesaria, M.
dc.contributor.authorBahl, S.
dc.contributor.authorGupta, A.
dc.contributor.authorShivaprasad, S. M.
dc.contributor.authorViswanadham, C. S.
dc.contributor.authorKulkarni, U. D.
dc.contributor.authorDey, G. K.
dc.date.accessioned2013-03-18T08:22:07Z
dc.date.available2013-03-18T08:22:07Z
dc.date.issued2012
dc.description.divisionMSDen
dc.format.extent4581 bytes
dc.format.mimetypetext/html
dc.identifier.sourceMaterials Science Forum, 2012. Vol. 710: pp. 757-761en
dc.identifier.urihttp://hdl.handle.net/123456789/7071
dc.language.isoenen
dc.subjectPulsed Laser Deposition (PLD)en
dc.subjectzirconium oxideen
dc.subjectthin film characterizationen
dc.subjectRaman Spectroscopyen
dc.subjectX-ray Photo-electron Spectroscopy (XPS)en
dc.titleRole of substrate temperature in the pulsed laser deposition of zirconium oxide thin filmen
dc.typeArticleen

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