Effect of argon ion activity on the properties of Y2O3 thin films deposited by low pressure PACVD
No Thumbnail Available
Click here to download
Date
2010
Journal Title
Journal ISSN
Volume Title
Publisher
Abstract
Description
Keywords
Microwave ECR plasma, MOCVD, Thin films, Y2O3, FAR-IR, GIXRD
Source
Applied Surface Science, 2010. Vol. 257 (1): pp. 215-221