Kinetic study of the gas-phase reaction of hydroxyl radical with CF3CH2OCH2CF3 using the laser photolysis-laser induced fluorescence method

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dc.contributor.authorSenGupta, S.
dc.contributor.authorIndulkar, Y.
dc.contributor.authorA. Kumar
dc.contributor.authorDhanya, S.
dc.contributor.authorNaik, P. D.
dc.contributor.authorBajaj, P. N.
dc.date.accessioned2011-04-06T05:37:25Z
dc.date.available2011-04-06T05:37:25Z
dc.date.issued2010
dc.format.extent4435 bytes
dc.format.mimetypetext/html
dc.identifier.sourceInternational Journal of Chemical Kinetics, 2010. Vol. 42 (8): pp. 519-525en
dc.identifier.urihttp://hdl.handle.net/123456789/4467
dc.language.isoenen
dc.subjectKinetic studyen
dc.subjectgas-phase reactionen
dc.subjecthydroxyl radicalen
dc.subjectCF3CH2OCH2CF3en
dc.subjectlaser photolysis-laser induced fluorescence methoden
dc.titleKinetic study of the gas-phase reaction of hydroxyl radical with CF3CH2OCH2CF3 using the laser photolysis-laser induced fluorescence methoden
dc.typeArticleen

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