Development of rf plasma sputtered Al2O3-TiO2 multilayer broad band antireflecting coatings and its correlation with plasma parameters

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dc.contributor.authorLaha, P.
dc.contributor.authorPanda, A. B.
dc.contributor.authorMahapatra, S. K.
dc.contributor.authorBarhai, P. K.
dc.contributor.authorDas, A. K.
dc.contributor.authorBanerjee, I.
dc.date.accessioned2012-07-05T06:19:21Z
dc.date.available2012-07-05T06:19:21Z
dc.date.issued2012
dc.description.divisionL&PTDen
dc.format.extent4697 bytes
dc.format.mimetypetext/html
dc.identifier.sourceApplied Surface Science, 2012. Vol. 258: pp. 2275-2282en
dc.identifier.urihttp://hdl.handle.net/123456789/6263
dc.language.isoenen
dc.subjectAl2O3en
dc.subjectTiO2en
dc.subjectX-ray photoemission spectroscopy (XPS)en
dc.subjectPLen
dc.subjectOptical propertiesen
dc.subjectOESen
dc.titleDevelopment of rf plasma sputtered Al2O3-TiO2 multilayer broad band antireflecting coatings and its correlation with plasma parametersen
dc.typeArticleen

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