Reactive electron beam evaporation of gadolinium oxide optical thin films for ultraviolet and deep ultraviolet laser wavelengths

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dc.contributor.authorSahoo, N. K.
dc.contributor.authorThakur, S.
dc.contributor.authorSenthilkumar, M.
dc.contributor.authorBhattacharyya, D.
dc.contributor.authorDas, N. C.
dc.date.accessioned2021-08-25T07:19:37Z
dc.date.available2021-08-25T07:19:37Z
dc.date.issued2003
dc.description.divisionSpect. Div.en
dc.format.extent4285 bytes
dc.format.mimetypetext/html
dc.identifier.sourceThin Solid Films, 2003. Vol. 440 (42767): pp. 155-168en
dc.identifier.urihttp://hdl.handle.net/123456789/23335
dc.language.isoenen
dc.subjectMultilayersen
dc.subjectOptical propertiesen
dc.subjectAtomic force microscopyen
dc.subjectOptical coatingen
dc.subjectSurface morphologyen
dc.subjectEllipsometryen
dc.subjectGadolinium oxideen
dc.subjectMicrostructural propertiesen
dc.subjectViscoelastic propertyen
dc.subjectForce modulationen
dc.subjectE-beam evaporationen
dc.titleReactive electron beam evaporation of gadolinium oxide optical thin films for ultraviolet and deep ultraviolet laser wavelengthsen
dc.typeArticleen

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