Enhanced nucleation and post-growth investigations on HFCVD diamond films grown on silicon single crystals pretreated with Zr:diamond mixed slurry

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dc.contributor.authorDua, A. K.
dc.contributor.authorRoy, M.
dc.contributor.authorNuwad, J.
dc.contributor.authorGeorge, V. C.
dc.contributor.authorSawant, S. N.
dc.date.accessioned2021-03-17T06:47:00Z
dc.date.available2021-03-17T06:47:00Z
dc.date.issued2004
dc.description.divisionNM&SCDen
dc.format.extent4547 bytes
dc.format.mimetypetext/html
dc.identifier.sourceApplied Surface Science, 2004. Vol. 229 (42826): pp. 254-262en
dc.identifier.urihttp://hdl.handle.net/123456789/22549
dc.language.isoenen
dc.subjectSubstrate pretreatmenten
dc.subjectZr:diamond mixed slurryen
dc.subjectNucleationen
dc.subjectHFCVDen
dc.subjectDiamond filmsen
dc.titleEnhanced nucleation and post-growth investigations on HFCVD diamond films grown on silicon single crystals pretreated with Zr:diamond mixed slurryen
dc.typeArticleen

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