Influence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin films

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dc.contributor.authorJena, S.
dc.contributor.authorTokas, R. B.
dc.contributor.authorTripathi, S.
dc.contributor.authorRao, K. D.
dc.contributor.authorUdupa, D. V.
dc.contributor.authorThakur, S.
dc.contributor.authorSahoo, N. K.
dc.date.accessioned2019-05-23T06:51:48Z
dc.date.available2019-05-23T06:51:48Z
dc.date.issued2019
dc.description.divisionA&MPD;BARCF-Ven
dc.format.extent4635 bytes
dc.format.mimetypetext/html
dc.identifier.sourceJournal of Alloys and Compounds, 2019. Vol. 771: pp. 373-381en
dc.identifier.urihttp://hdl.handle.net/123456789/18495
dc.language.isoenen
dc.subjectHfO2 thin filmsen
dc.subjectMicrostructureen
dc.subjectOptical propertiesen
dc.subjectResidual stressen
dc.subjectLaser induced damage thresholden
dc.titleInfluence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin filmsen
dc.typeArticleen

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