Influence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin films

No Thumbnail Available

Click here to download

0030.htm (4.53 KB)

Date

2019

Authors

Journal Title

Journal ISSN

Volume Title

Publisher

Abstract

Description

Keywords

HfO2 thin films, Microstructure, Optical properties, Residual stress, Laser induced damage threshold

Source

Journal of Alloys and Compounds, 2019. Vol. 771: pp. 373-381

URI

http://hdl.handle.net/123456789/18495

Collections

2019