Response of magnetron sputtered AlN films to controlled atmosphere annealing

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dc.contributor.authorJose, F.
dc.contributor.authorRamaseshan, R.
dc.contributor.authorDash, S.
dc.contributor.authorBera, S.
dc.contributor.authorTyagi, A. K.
dc.contributor.authorRaj, B.
dc.date.accessioned2010-12-13T08:22:26Z
dc.date.available2010-12-13T08:22:26Z
dc.date.issued2010
dc.format.extent3526 bytes
dc.format.mimetypetext/html
dc.identifier.sourceJournal of Physics D-Applied Physics. Vol. 43 (7): Article no.75304en
dc.identifier.urihttp://hdl.handle.net/123456789/4090
dc.language.isoenen
dc.subjectmagnetron sputtered AlN filmsen
dc.subjectcontrolled atmosphere annealingen
dc.subjectamorphous AlN filmsen
dc.subjecthigh vacuumen
dc.subjectnitrogen atmosphereen
dc.titleResponse of magnetron sputtered AlN films to controlled atmosphere annealingen
dc.typeArticleen

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