Response of magnetron sputtered AlN films to controlled atmosphere annealing

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Date

2010

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Abstract

Description

Keywords

magnetron sputtered AlN films, controlled atmosphere annealing, amorphous AlN films, high vacuum, nitrogen atmosphere

Source

Journal of Physics D-Applied Physics. Vol. 43 (7): Article no.75304

URI

http://hdl.handle.net/123456789/4090

Collections

2010