Influence of ion-to-atom ratio on the microstructure of evaporated molybdenum thin films grown using low energy argon ions

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dc.contributor.authorYadav, P. K.
dc.contributor.authorSant, T.
dc.contributor.authorMukherjee, C.
dc.contributor.authorNayak, M.
dc.contributor.authorRai, S. K.
dc.contributor.authorLodha, G. S.
dc.contributor.authorSharma, S. M.
dc.date.accessioned2015-03-09T09:00:10Z
dc.date.available2015-03-09T09:00:10Z
dc.date.issued2014
dc.description.divisionHP&SRPDen
dc.format.extent4432 bytes
dc.format.mimetypetext/html
dc.identifier.sourceJournal of Vacuum Science & Technology-A, 2014. Vol. 32 (2): Article no. 21509en
dc.identifier.urihttp://hdl.handle.net/123456789/10423
dc.language.isoenen
dc.subjection-to-atom ratioen
dc.subjectmicrostructureen
dc.subjectmolybdenum thin filmsen
dc.subjectlow energy argon ionsen
dc.titleInfluence of ion-to-atom ratio on the microstructure of evaporated molybdenum thin films grown using low energy argon ionsen
dc.typeArticleen

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