EXAFS study on yttrium oxide thin films deposited by RF plasma enhanced MOCVD under the influence of varying RF self-bias

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dc.contributor.authorChopade, S. S.
dc.contributor.authorNayak, C.
dc.contributor.authorBhattacharyya, D.
dc.contributor.authorJha, S. N.
dc.contributor.authorTokas, R. B.
dc.contributor.authorSahoo, N. K.
dc.contributor.authorPatil, D. S.
dc.date.accessioned2015-01-09T07:23:53Z
dc.date.available2015-01-09T07:23:53Z
dc.date.issued2014
dc.description.divisionL&PTD;A&MPDen
dc.format.extent5159 bytes
dc.format.mimetypetext/html
dc.identifier.sourceApplied Surface Science, 2014. Vol. 314: pp. 400-407en
dc.identifier.urihttp://hdl.handle.net/123456789/10200
dc.language.isoenen
dc.subjectEXAFSen
dc.subjectThin filmsen
dc.subjectYttrium oxideen
dc.subjectPlasma CVDen
dc.subjectAtomic force microscopyen
dc.titleEXAFS study on yttrium oxide thin films deposited by RF plasma enhanced MOCVD under the influence of varying RF self-biasen
dc.typeArticleen

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