Study of structural, optical and electrical properties of gamma irradiated In2O3 thin films for device applications

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dc.contributor.authorSudha, A.
dc.contributor.authorSharma, S. L.
dc.contributor.authorSharma, S. D.
dc.date.accessioned2017-09-29T06:53:40Z
dc.date.available2017-09-29T06:53:40Z
dc.date.issued2017
dc.description.divisionRP&ADen
dc.format.extent4570 bytes
dc.format.mimetypetext/html
dc.identifier.sourceJournal of Materials Science: Materials in Electronics, 2017. Vol. 28 (6): pp. 4619-4624en
dc.identifier.urihttp://hdl.handle.net/123456789/15036
dc.language.isoenen
dc.subjectStudy of structural, optical and electrical propertiesen
dc.subjectgamma irradiated In2O3 thin filmsen
dc.subjectdevice applicationsen
dc.subjectX-ray diffraction analysisen
dc.titleStudy of structural, optical and electrical properties of gamma irradiated In2O3 thin films for device applicationsen
dc.typeArticleen

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