RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization

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dc.contributor.authorChopade, S. S.
dc.contributor.authorNayak, C.
dc.contributor.authorBhattacharyya, D.
dc.contributor.authorJha, S. N.
dc.contributor.authorTokas, R. B.
dc.contributor.authorSahoo, N. K.
dc.contributor.authorDeo, M. N.
dc.contributor.authorBiswas, A.
dc.contributor.authorRai, S.
dc.contributor.authorThulasi Raman, K. H.
dc.contributor.authorRao, G. M.
dc.contributor.authorNiranjan Kumar
dc.contributor.authorPatil, D. S.
dc.date.accessioned2016-02-04T09:28:12Z
dc.date.available2016-02-04T09:28:12Z
dc.date.issued2015
dc.description.divisionL&PTD;A&MPD;HP&SRPDen
dc.format.extent4402 bytes
dc.format.mimetypetext/html
dc.identifier.sourceApplied Surface Science, 2015. Vol. 355: pp. 82-92en
dc.identifier.urihttp://hdl.handle.net/123456789/12309
dc.language.isoenen
dc.subjectYSZen
dc.subjectRF plasmaen
dc.subjectMOCVDen
dc.subjectEllipsometryen
dc.subjectEXAFSen
dc.subjectXANESen
dc.titleRF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterizationen
dc.typeArticleen

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