Effect of impinging ion energy on the substrates during deposition of SiOx films by radiofrequency plasma enhanced chemical vapor deposition process

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Date

2011

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Volume Title

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Abstract

Description

Keywords

RF plasma, Ion energy, Thin films, Plasma diagnostics, Silicon oxide, Plasma assisted chemical vapor deposition, Hexamethyldisiloxane

Source

Thin Solid Films, 2011. Vol. 519 (22): pp. 7864-7870

URI

http://hdl.handle.net/123456789/5821

Collections

2011