Effects of precursor evaporation temperature on the properties of the yttrium oxide thin films deposited by microwave electron cyclotron resonance plasma assisted metal organic chemical vapor deposition

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Date

2011

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Keywords

Microwave electron cyclotron resonance plasma, Metal organic chemical vapor deposition, Thin films, Yttrium oxide, Far-infrared, Thermogravimetry

Source

Thin Solid Films, 2011. Vol. 519 (10): pp. 3011-3020

URI

http://hdl.handle.net/123456789/5509

Collections

2011