SiOx containing diamond like carbon coatings: Effect of substrate bias during deposition

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dc.contributor.authorBarve, S. A.
dc.contributor.authorChopade, S. S.
dc.contributor.authorKar, R.
dc.contributor.authorChand, N.
dc.contributor.authorDeo, M. N.
dc.contributor.authorBiswas, A.
dc.contributor.authorPatel, N. N.
dc.contributor.authorSinha, S.
dc.date.accessioned2020-09-14T05:41:18Z
dc.date.available2020-09-14T05:41:18Z
dc.date.issued2017
dc.description.divisionL&PTD;ASD;HP&SRPDen
dc.format.extent4562 bytes
dc.format.mimetypetext/html
dc.identifier.sourceDiamond & Related Materials, 2017. Vol. 71: pp. 63-72en
dc.identifier.urihttp://hdl.handle.net/123456789/20590
dc.language.isoenen
dc.subjectDiamond like carbonen
dc.subjectDLC-SiOxen
dc.subjectRF CVDen
dc.subjectThin filmsen
dc.titleSiOx containing diamond like carbon coatings: Effect of substrate bias during depositionen
dc.typeArticleen

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