Aerosol assisted chemical vapour deposition of germanium thin films using organogermanium carboxylates as precursors and formation of germania films

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dc.contributor.authorShah, A. Y.
dc.contributor.authorWadawale, A.
dc.contributor.authorSagoria, V. S.
dc.contributor.authorJain, V. K.
dc.contributor.authorBetty, C. A.
dc.contributor.authorBhattacharya, S.
dc.date.accessioned2013-03-12T08:58:15Z
dc.date.available2013-03-12T08:58:15Z
dc.date.issued2012
dc.description.divisionChD;ThPDen
dc.format.extent4182 bytes
dc.format.mimetypetext/html
dc.identifier.sourceBulletin of Materials Science, 2012. Vol. 35 (3): pp. 365-368en
dc.identifier.urihttp://hdl.handle.net/123456789/6997
dc.language.isoenen
dc.subjectOrganogermaniumen
dc.subjectgermanium thin filmsen
dc.subjectAACVDen
dc.subjectXRDen
dc.titleAerosol assisted chemical vapour deposition of germanium thin films using organogermanium carboxylates as precursors and formation of germania filmsen
dc.typeArticleen

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