Surface characterization of magnesium fluoride thin films prepared by a fluorine trapping based non-reactive sputtering technique

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dc.contributor.authorDe, R.
dc.contributor.authorHaque, S. M.
dc.contributor.authorTripathi, S.
dc.contributor.authorRao, K. D.
dc.contributor.authorPrathap, C.
dc.contributor.authorSahoo, N. K.
dc.date.accessioned2018-04-19T06:16:11Z
dc.date.available2018-04-19T06:16:11Z
dc.date.issued2016
dc.description.divisionA&MPDen
dc.format.extent4656 bytes
dc.format.mimetypetext/html
dc.identifier.sourceVacuum, 2016. Vol. 134: pp. 110-119en
dc.identifier.urihttp://hdl.handle.net/123456789/16076
dc.language.isoenen
dc.subjectMgF2 thin filmsen
dc.subjectRF magnetron sputteringen
dc.subjectEllipsometryen
dc.subjectAtomic force microscopyen
dc.subjectSurface correlation functionsen
dc.subjectRoughness evaluationen
dc.titleSurface characterization of magnesium fluoride thin films prepared by a fluorine trapping based non-reactive sputtering techniqueen
dc.typeArticleen

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