Influence of the Ar/N2 ratio on the preferred orientation and optical reflectance of reactively sputter deposited titanium nitride thin films

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dc.contributor.authorBanerjee, R.
dc.contributor.authorSingh, K.
dc.contributor.authorAyyub, P.
dc.date.accessioned2022-02-10T10:48:59Z
dc.date.available2022-02-10T10:48:59Z
dc.date.issued2003
dc.description.divisionMPDen
dc.format.extent4073 bytes
dc.format.mimetypetext/html
dc.identifier.sourceJournal of Vacuum Science and Technology-A, 2003. Vol. 21 (1): pp. 310-317en
dc.identifier.urihttp://hdl.handle.net/123456789/24019
dc.language.isoenen
dc.subjectAr/N2 ratioen
dc.subjectorientation and optical reflectanceen
dc.subjectsputter deposited titanium nitride thin filmsen
dc.subjectTitanium nitride thin filmsen
dc.subjectx-ray diffraction and transmission electron microscopyen
dc.titleInfluence of the Ar/N2 ratio on the preferred orientation and optical reflectance of reactively sputter deposited titanium nitride thin filmsen
dc.typeArticleen

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