Influence of the Ar/N2 ratio on the preferred orientation and optical reflectance of reactively sputter deposited titanium nitride thin films

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Date

2003

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Keywords

Ar/N2 ratio, orientation and optical reflectance, sputter deposited titanium nitride thin films, Titanium nitride thin films, x-ray diffraction and transmission electron microscopy

Source

Journal of Vacuum Science and Technology-A, 2003. Vol. 21 (1): pp. 310-317

URI

http://hdl.handle.net/123456789/24019

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2003