Study of Low Energy (50 keV) Silicon Negative ion Implantation in GaAs

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dc.contributor.authorYadav, A.
dc.contributor.authorDubey, S.
dc.contributor.authorDubey, R.
dc.contributor.authorSubramanyam, N.
dc.date.accessioned2021-04-05T08:58:35Z
dc.date.available2021-04-05T08:58:35Z
dc.date.issued2020
dc.description.divisionBARCen
dc.format.extent4263 bytes
dc.format.mimetypetext/html
dc.identifier.sourceMaterials Today: Proceedings, 2020. Vol. 23: pp. 309-316en
dc.identifier.urihttp://hdl.handle.net/123456789/22676
dc.language.isoenen
dc.subjectSilicon negative ion implantationen
dc.subjectSEMen
dc.subjectEDXen
dc.subjectAFMen
dc.subjectXRDen
dc.titleStudy of Low Energy (50 keV) Silicon Negative ion Implantation in GaAsen
dc.typeArticleen

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