H2S Sensing Properties of RF Sputtered NiO Thin Films

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dc.contributor.authorBagwaiya, T.
dc.contributor.authorGoyal, C. P.
dc.contributor.authorBhattacharya, S.
dc.contributor.authorRamgir, N. S.
dc.contributor.authorBhattacharya, D.
dc.contributor.authorKoiry, S. P.
dc.contributor.authorAswal, D. K.
dc.contributor.authorGupta, S. K.
dc.date.accessioned2015-05-15T10:00:39Z
dc.date.available2015-05-15T10:00:39Z
dc.date.issued2014
dc.description.divisionTPD;SSPDen
dc.format.extent3614 bytes
dc.format.mimetypetext/html
dc.identifier.sourceAIP Conference Proceedings, 2014. Vol. 1591: pp. 938-940en
dc.identifier.urihttp://hdl.handle.net/123456789/11026
dc.language.isoenen
dc.subjectGas sensingen
dc.subjectThin Filmen
dc.subjectSputter depositionen
dc.subjectH2Sen
dc.subjectXRRen
dc.titleH2S Sensing Properties of RF Sputtered NiO Thin Filmsen
dc.typeArticleen

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