Microwave ECR Plasma Assisted MOCVD of Y2O3 Thin Films Using Y(tod)3 Precursor and Their Characterization

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Date

2011

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Description

Keywords

Microwave ECR Plasma, MOCVD, Y2O3 Thin Films, Yttrium oxide, metal organic chemical vapour deposition, X-ray photoelectron spectroscopy

Source

Plasma Processes and Polymers, 2011. Vol. 8 (8): pp. 740-749

URI

http://hdl.handle.net/123456789/5708

Collections

2011