Statistics for Photodissociation of trifluoroacetic acid at 193 nm: Mechanism for formation of OH radical and stable products
Total visits
| views | |
|---|---|
| Photodissociation of trifluoroacetic acid at 193 nm: Mechanism for formation of OH radical and stable products | 0 |
Total visits per month
| views | |
|---|---|
| November 2024 | 0 |
| December 2024 | 0 |
| January 2025 | 0 |
| February 2025 | 0 |
| March 2025 | 0 |
| April 2025 | 0 |
| May 2025 | 0 |