Ghosh, S. K.Bera, T.Karacasu, O.Swarnakar, A.Buijnsters, J. G.Celis, J. P.2012-09-062012-09-062011Electrochimica Acta, 2011. Vol. 56: pp. 2433-2442http://hdl.handle.net/123456789/66904487 bytestext/htmlenThin filmMoS2 nanotubeIF-MoS2Coefficient of frictionElectrochemical depositionNanostructured MoSx-based thin films obtained by electrochemical reductionArticle