Effect of O2/Ar gas flow ratio on the optical properties and mechanical stress of sputtered HfO2 thin films

Jena, S.Tokas, R. B.Misal, J. S.Rao, K. D.Udupa, D. V.Thakur, S.Sahoo, N. K.2016-03-042016-03-042015Thin Solid Films, 2015. Vol. 592: pp. 135-142http://hdl.handle.net/123456789/125794913 bytestext/htmlenHfO2 thin filmSputteringOptical propertiesResidual stressEffect of O2/Ar gas flow ratio on the optical properties and mechanical stress of sputtered HfO2 thin filmsArticle