Photodissociation of trifluoroacetic acid at 193 nm: Mechanism for formation of OH radical and stable products

SenGupta, S.Saha, A.Awadhesh KumarNaik, P. D.2019-06-032019-06-032018Journal of Photochemistry & Photobiology A: Chemistry, 2018. Vol. 367: pp. 365-374http://hdl.handle.net/123456789/186135023 bytestext/htmlenTrifluoroacetic acidPhotodissociationOH radicalDynamicsLaser Induced FluorescencePhotodissociation of trifluoroacetic acid at 193 nm: Mechanism for formation of OH radical and stable productsArticle