Influence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin films

Jena, S.Tokas, R. B.Tripathi, S.Rao, K. D.Udupa, D. V.Thakur, S.Sahoo, N. K.2019-05-232019-05-232019Journal of Alloys and Compounds, 2019. Vol. 771: pp. 373-381http://hdl.handle.net/123456789/184954635 bytestext/htmlenHfO2 thin filmsMicrostructureOptical propertiesResidual stressLaser induced damage thresholdInfluence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin filmsArticle