An Electrochemical Method for Fast and Controlled Etching of Fluorine-Doped Tin Oxide Coated Glass Substrates

Koiry, S. P.Jha, P.Veerender, P.Sridevi, C.Debnath, A. K.Chauhan, A. K.Muthe, K. P.Gadkari, S. C.2018-06-122018-06-122017Journal of the Electrochemical Society, 2017. Vol. 164 (2): pp. E1-E4http://hdl.handle.net/123456789/163964331 bytestext/htmlenElectrochemical MethodFast and Controlled EtchingFluorine-Doped Tin OxideGlass SubstrateX-ray photoelectron spectroscopyAn Electrochemical Method for Fast and Controlled Etching of Fluorine-Doped Tin Oxide Coated Glass SubstratesArticle