Selvakumar, J.Nagaraja, K. S.Sathiyamoorthy, D.2012-03-122012-03-122011Journal of Nanoscience & Nanotechnology, 2011. Vol. 11 (9): pp. 8190-8197http://hdl.handle.net/123456789/58464685 bytestext/htmlenMetallorganic and Organometallic PrecursorsThermogravimetryAntoine CoefficientsSolid-State KineticsActivation EnergyThin FilmsRelevance of Thermodynamic and Kinetic Parameters of Chemical Vapor Deposition PrecursorsArticle