Jose, F.Ramaseshan, R.Dash, S.Bera, S.Tyagi, A. K.Raj, B.2010-12-132010-12-132010Journal of Physics D-Applied Physics. Vol. 43 (7): Article no.75304http://hdl.handle.net/123456789/40903526 bytestext/htmlenmagnetron sputtered AlN filmscontrolled atmosphere annealingamorphous AlN filmshigh vacuumnitrogen atmosphereResponse of magnetron sputtered AlN films to controlled atmosphere annealingArticle