EXAFS study on yttrium oxide thin films deposited by RF plasma enhanced MOCVD under the influence of varying RF self-bias

Chopade, S. S.Nayak, C.Bhattacharyya, D.Jha, S. N.Tokas, R. B.Sahoo, N. K.Patil, D. S.2015-01-092015-01-092014Applied Surface Science, 2014. Vol. 314: pp. 400-407http://hdl.handle.net/123456789/102005159 bytestext/htmlenEXAFSThin filmsYttrium oxidePlasma CVDAtomic force microscopyEXAFS study on yttrium oxide thin films deposited by RF plasma enhanced MOCVD under the influence of varying RF self-biasArticle