Dhere, S. L.Latthe, S. S.Kappenstein, C.Mukherjee, S. K.Rao, A. V.2010-12-022010-12-022010Applied Surface Science. Vol. 256 (12): pp. 3967-3971http://hdl.handle.net/123456789/40394196 bytestext/htmlenSILARBand gapThin filmHydrophobicComparative studies on p-type CuI grown on glass and copper substrate by SILAR methodArticle