Characterization of r.f. sputtered thin Mo, W and Si films as precursors to multilayer X-ray mirrors

Bhattacharyya, D.Joseph, D.Poswal, A. K.2006-10-312006-10-312006http://hdl.handle.net/123456789/1014626 bytestext/htmlenX-ray mirrorX-ray reﬂectivityr.f. sputteringCharacterization of r.f. sputtered thin Mo, W and Si films as precursors to multilayer X-ray mirrorsArticle