Sagdeo, P. R.Maidul, S.Shinde, D. D.Misal, J. S.Thakur, S.Sahoo, N. K.Sagdeo, A.Rai, S.Mukherjee, C.Rajiv, K.Sathe, V. G.Bhattacharyya, D. K.2012-11-152012-11-152012AIP Conference Proceedings, 2012. Vol. 1451: pp. 121-123http://hdl.handle.net/123456789/68044009 bytestext/htmlenDeposition of TiO2Pulsed DC sputteringOxygen partial pressureEnergy transfer during depositionCrystallographic phase control of TiO2 in thin films deposited by asymmetric bipolar pulsed DC sputteringArticle