Surface roughness and interface diffusion studies on thin Mo and W films and Mo/Si and W/Si interfaces

Bhattacharyya, D.Poswal, A. K.Senthilkumar, M.Das, N. C.2021-08-052021-08-052003Applied Surface Science, 2003. Vol. 214: pp. 259-271http://hdl.handle.net/123456789/232294433 bytestext/htmlenSurface roughnessInterface diffusionSpectroscopic ellipsometrySIMSSurface roughness and interface diffusion studies on thin Mo and W films and Mo/Si and W/Si interfacesArticle