Sahoo, G. S.Tripathy, S. P.Sharma, S. D.Bandyopadhyay, T.2016-03-072016-03-072015Nuclear Instruments & Methods in Physics Research-A, 2015. Vol. 800: pp. 51-56http://hdl.handle.net/123456789/125944254 bytestext/htmlenCR-39Microwave induced chemical etchingBulk etch rateEtchant concentrationMicrowave powerEffect of etchant concentration on microwave induced chemical etching (MICE) of CR-39 detectorArticle