Chopade, S. S.Nayak, C.Bhattacharyya, D.Jha, S. N.Tokas, R. B.Sahoo, N. K.Deo, M. N.Biswas, A.Rai, S.Thulasi Raman, K. H.Rao, G. M.Niranjan KumarPatil, D. S.2016-02-042016-02-042015Applied Surface Science, 2015. Vol. 355: pp. 82-92http://hdl.handle.net/123456789/123094402 bytestext/htmlenYSZRF plasmaMOCVDEllipsometryEXAFSXANESRF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterizationArticle