Effects of precursor evaporation temperature on the properties of the yttrium oxide thin films deposited by microwave electron cyclotron resonance plasma assisted metal organic chemical vapor deposition

Barve, S. A.JagannathMithal, N.Deo, M. N.Biswas, A.Mishra, R.Kishore, R.Bhanage, B. M.Gantayet, L. M.Patil, D. S.2011-12-162011-12-162011Thin Solid Films, 2011. Vol. 519 (10): pp. 3011-3020http://hdl.handle.net/123456789/55095043 bytestext/htmlenMicrowave electron cyclotron resonance plasmaMetal organic chemical vapor depositionThin filmsYttrium oxideFar-infraredThermogravimetryEffects of precursor evaporation temperature on the properties of the yttrium oxide thin films deposited by microwave electron cyclotron resonance plasma assisted metal organic chemical vapor depositionArticle