Abezgauz, L.Kuperkar, K.Hassan, P. A.Ramon, O.Bahadur, P.Danino, D.2010-12-282010-12-282010Journal of Colloid and Interface Science. Vol. 342 (1): pp. 83-92http://hdl.handle.net/123456789/41204550 bytestext/htmlenSurfactantCMCMicellizationMicellar growthDLSCryo-TEMHofmeister seriesEffect of Hofmeister anions on micellization and micellar growth of the surfactant cetylpyridinium chlorideArticle