Influence of the Ar/N2 ratio on the preferred orientation and optical reflectance of reactively sputter deposited titanium nitride thin films

Banerjee, R.Singh, K.Ayyub, P.2022-02-102022-02-102003Journal of Vacuum Science and Technology-A, 2003. Vol. 21 (1): pp. 310-317http://hdl.handle.net/123456789/240194073 bytestext/htmlenAr/N2 ratioorientation and optical reflectancesputter deposited titanium nitride thin filmsTitanium nitride thin filmsx-ray diffraction and transmission electron microscopyInfluence of the Ar/N2 ratio on the preferred orientation and optical reflectance of reactively sputter deposited titanium nitride thin filmsArticle