Characterization of ion beam sputter deposited W and Si films and W/Si interfaces by grazing incidence X-ray reflectivity, atomic force microscopy and spectroscopic ellipsometry

Biswas, A.Poswal, A. K.Tokas, R. B.Bhattacharyya, D.2010-03-152010-03-152008http://hdl.handle.net/123456789/21273796 bytestext/htmlenIBSGIXRSECharacterization of ion beam sputter deposited W and Si films and W/Si interfaces by grazing incidence X-ray reflectivity, atomic force microscopy and spectroscopic ellipsometryArticle